Vacuum ultraviolet to visible emission of some pure gases and their mixtures used for plasma processing

被引：30

作者：

Fozza, AC

Kruse, A

Hollander, A

Ricard, A

Wertheimer, MR ^{[1
]}

机构：

[1] Ecole Polytech, Couches Minces Grp, Montreal, PQ H3C 3A7, Canada

[2] Ecole Polytech, Dept Engn Phys, Montreal, PQ H3C 3A7, Canada

[3] Fraunhofer Inst Appl Mat Res, D-28717 Bremen, Germany

[4] Fraunhofer Inst Appl Polymer Res, D-14513 Teltow, Germany

[5] Univ Toulouse 3, Ctr Phys Atom Toulouse, F-31062 Toulouse, France

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1998年 / 16卷 / 01期

关键词：

D O I：

10.1116/1.581014

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The vacuum ultraviolet (VUV) to near infrared emissions (112 less than or equal to lambda less than or equal to 880 nm) from molecular gases (H-2 and O-2) and molecular gas-noble gas mixtures (H-2-Ar and O-2-Ar) have been investigated with two separate spectrophotometric instruments. We report the influence of plasma parameters such as gas composition, pressure, and microwave power upon the plasma emission. In the case of mixtures with noble gases, we selected a range of plasma parameters so as to obtain very intense VUV emissions, which can be useful for the photochemical treatment of polymer surfaces. Some kinetics mechanisms involved are discussed. (C) 1998 American Vacuum Society.

引用

页码：72 / 77

页数：6

共 31 条

[1] LABORATORY STUDIES OF UV EMISSIONS OF H-2 BY ELECTRON-IMPACT - THE WERNER-BAND AND LYMAN-BAND SYSTEMS [J].