Sn film deposition on silica glass substrates

被引：13

作者：

Hishita, S

Stryhal, Z

Sakaguchi, I

Ohashi, N

Saito, N

Haneda, H

机构：

[1] Natl Inst Mat Sci, Adv Mat Lab, Tsukuba, Ibaraki 3050044, Japan

[2] Charles Univ, Dept Elect & Vacuum Phys, Prague, Czech Republic

来源：

THIN SOLID FILMS | 2004年 / 464卷

关键词：

tin film; silica glass substrate; single crystalline film; AFM; vacuum deposition;

D O I：

10.1016/j.tsf.2004.06.072

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Atomic force microscopy (AFM) and X-ray diffraction (XRD) have been used to characterize surface structures of Sri thin films grown on SiO2 glass substrates. The surface morphology of the Sn thin films is found to be strongly dependent on the film thickness and the growth temperature. The 100-nm-thick Sri film grown at 330 K is mainly composed of flat-top islands with a grain size of 400 nm in diameter and shows the preferred orientation of the a-axis perpendicular to the substrate surface. (C) 2004 Elsevier B.V. All rights reserved.

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页码：146 / 149

页数：4

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