Radiation-induced reactions of chemically amplified x-ray and electron-beam resists based on deprotection of t-butoxycarbonyl groups

被引:107
作者
Kozawa, T
Nagahara, S
Yoshida, Y
Tagawa, S
Watanabe, T
Yamshita, Y
机构
[1] Osaka Univ, Inst Sci & Ind Res, Ibaraki, Osaka 567, Japan
[2] SORTEC Corp, Tsukuba, Ibaraki 30042, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1997年 / 15卷 / 06期
关键词
D O I
10.1116/1.589689
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Radiation-induced reactions in chemically amplified resists based on deprotection of t-butoxycarbonyl groups have been investigated by both time-resolved (the pulse radiolysis methods) and steady-state optical absorption spectroscopy, Upon exposure of a partially tBOC-protected novolak by electron and synchrotron radiation beams, the yields of the intermediates contributing to the acid generation (phenoxyl radical and proton adducts of base resin) decreased with increasing the protection ratio of hydroxyl groups. Therefore, the efficiency of the acid generation is closely related with the protection ratio. The relation of the acid generation mechanism with the protection ratio was discussed. (C) 1997 American Vacuum Society.
引用
收藏
页码:2582 / 2586
页数:5
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