ACID GENERATION PROCESS BY RADIATION-INDUCED REACTION IN CHEMICALLY AMPLIFIED RESIST FILMS

被引：10

作者：

WATANABE, T

YAMASHITA, Y

KOZAWA, T

YOSHIDA, Y

TAGAWA, S

机构：

[1] UNIV TOKYO,FAC ENGN,NUCL ENGN RES LAB,TOKAI,IBARAKI 31911,JAPAN

[2] OSAKA UNIV,INST SCI & IND RES,IBARAKI,OSAKA 567,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587567

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3879 / 3883

页数：5

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