Material design of hole transport materials capable of thick-film formation in organic light emitting diodes

被引:50
作者
Aonuma, Masaki
Oyamada, Takahito
Sasabe, Hiroyuki
Miki, Tetsuzou
Adachi, Chihaya
机构
[1] CIST, Dept Photon Mat Sci, Chitose, Hokkaido 0668655, Japan
[2] Hodogaya Chem Co, Tsukuba, Ibaraki 3050841, Japan
[3] Kyushu Univ, Ctr Future Chem, Fukuoka 8190395, Japan
关键词
D O I
10.1063/1.2733627
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this study, the authors show an empirical guideline for designing hole transport materials (HTMs) that suppress rises in driving voltage even with a few hundred nanometer thick film in the organic light emitting diodes (OLEDs). In a device structure of indium tin oxide (110 nm)/hole transport layer (HTL) (X nm)/4,4(')-N,N-'-bis[N-(1-naphthyl)-N-phenyl-amino]biphenyl (10 nm)/tris-(8-hydroxyquinoline)aluminum (Alq(3)) (50 nm)/MgAg (100 nm)/Ag (10 nm), the authors compared electroluminescence characteristics of the OLEDs having a thin-film HTL (X=50 nm) and a thick-film HTL (X=300 nm) using 13 kinds of HTMs. They observed a closed correlation between suppression of the driving voltage and the HTMs' thermal characteristics. Highly thermally stable HTMs resulted in a small increase in the driving voltage. (c) 2007 American Institute of Physics.
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页数:3
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