Super-resolution near-field structure with alternative recording and mask materials

被引：16

作者：

Kim, J

Hwang, I

Yoon, D

Park, I

Shin, D

Kuwahara, M

Tominaga, J

机构：

[1] Samsung Elect Co Ltd, Digital Media R&D Ctr, Paldal Gu, Suwon 442742, South Korea

[2] AIST, Lab Adv Opt Technol, Tsukuba, Ibaraki 3058562, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2003年 / 42卷 / 2B期

关键词：

reactive diffusion (RD); super-resolution near-field structure (super-RENS); surface plasmon; W; WOx;

D O I：

10.1143/JJAP.42.1014

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Using a variety of recording materials, such as terbium-iron-cobalt (TbFeCo), tungsten (W), silver (Ag) and silver-zinc (Ag-Zn), the characteristics of super-resolution near-field structure (super-RENS) disks with the reactive diffusion (RD) recording mechanism were investigated. As a new. mask material, WO, which has a high transition temperature, was applied to a super-RENS disk. A combined W recording layer and WO, mask layer achieved much higher carrier-to-noise ratio (CNR), and better thermal stability, compared with AgOx light-scattering-type super-RENS disks.

引用

页码：1014 / 1017

页数：4

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