Photoreactivity of alkylsilane self-assembled monolayers on silicon surfaces and its application to preparing micropatterned ternary monolayers

被引：74

作者：

Hong, L ^{[1
]}

Sugimura, H ^{[1
]}

Furukawa, T ^{[1
]}

Takai, O ^{[1
]}

机构：

[1] Nagoya Univ, Dept Mat Proc Engn, Nagoya, Aichi, Japan

来源：

LANGMUIR | 2003年 / 19卷 / 06期

关键词：

D O I：

10.1021/la0205194

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The photoreactivity of an n-octadecyltrimethoxysilane self-assembled monolayer (ODS-SAM) on a Si substrate was investigated under the irradiation of vacuum ultraviolet (VUV) light of 172 nm in wavelength. The results of water contact angle, film thickness, and X-ray photoelectron spectroscopy analysis showed that the ODS-SAM decomposed gradually due to the VUV light exposure. Oxidized products, that is, -COOH groups, had formed before the ODS-SAM was completely decomposed and removed from the substrate. Coplanar ternary organosilane SAM microstructures have been successfully fabricated by employing the reaction between -OCH3 functional groups with -COOH groups on the VUV-modified ODS-SAM.

引用

页码：1966 / 1969

页数：4

共 26 条

[1] Fabrication of patterned amine reactivity templates using 4-chloromethylphenylsiloxane self-assembled monolayer films [J].