Design and fabrication of micromirror array supported by vertical springs

被引：24

作者：

Shin, JW

Chung, SW

Kim, YK

Choi, BK

机构：

[1] Seoul Natl Univ, Sch Elect Engn, Kwanak Gu, Seoul 151742, South Korea

[2] Samsung Elect Co Ltd, Paldal Gu, Suwon 441742, Kyungki Do, South Korea

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 1998年 / 66卷 / 1-3期

关键词：

micromirror arrays; vertical springs; electromechanical characteristics; high fill-factor;

D O I：

10.1016/S0924-4247(97)01762-7

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A 50 mu m x 50 mu m aluminum micromirror array has been fabricated using surface-micromachining technology. 50 x 50 micromirrors are arrayed two dimensionally. A micromirror plate is supported by a vertical spring structure which is placed underneath the mirror plate. With this structure, when the mirror plates reflect light, the micromirror array can have a large effective reflecting area. Only one mask and one shadow evaporation process are used in the fabrication of the vertical springs. The experimental electromechanical characteristics of the fabricated micromirror reveal that the downward threshold voltage is 8 V, the step response time is 17 mu s when 29 V step voltage is applied, and the resonance frequency is 11 kHz. No mechanical failure is found until after 200 million cycles of one-directional operation. (C) 1998 Published by Elsevier Science S.A. All rights reserved.

引用

页码：144 / 149

页数：6

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