Stabilization of substitutional Mn in silicon-based semiconductors

被引:34
作者
da Silva, AJR
Fazzio, A
Antonelli, A
机构
[1] Univ Sao Paulo, Inst Fis, BR-05315970 Sao Paulo, Brazil
[2] UNICAMP, Inst Fis, BR-13083970 Campinas, SP, Brazil
来源
PHYSICAL REVIEW B | 2004年 / 70卷 / 19期
基金
巴西圣保罗研究基金会;
关键词
D O I
10.1103/PhysRevB.70.193205
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We systematically investigate, using ab initio density-functional theory calculations, the properties of interstitial and substitutional Mn in both Si and Ge, as well as in the Si1-xGex alloy. We show that volume effects are not the main reason Mn prefers to be a subsitutional impurity in pure Ge, and chemical effects, therefore, play an important role. Using realistic models of Si1-xGex, we show that for xgreater than or similar to0.16 substitutional Mn in Ge-rich neighborhoods become more stable than interstitial Mn, which may allow the growth of Si-based diluted magnetic semiconductors.
引用
收藏
页码:1 / 4
页数:4
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