Surface structure control of GaAs (111)A vicinal substrates by metal-organic vapor-phase epitaxy

被引:7
作者
Lee, JS [1 ]
Isshiki, H [1 ]
Sugano, T [1 ]
Aoyagi, Y [1 ]
机构
[1] Inst Phys & Chem Res, Wako, Saitama 35101, Japan
关键词
metal-organic vapor-phase epitaxy; (1 1 1)A vicinal substrate; multistep; GaAs;
D O I
10.1016/S0022-0248(97)00393-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Periodic structures with high uniformity have been fabricated by metal-organic vapor-phase epitaxy on GaAs(111)A vicinal surfaces. Scanning electron microscope and atomic force microscope surface images show strict dependence on substrate off-direction, growth temperature (T-g), and V/III ratio. Giant steps with long-range continuity and high uniformity have been formed on GaAs (111)A substrates misoriented towards the [112] direction. In addition, the heights of the giant steps show the saturation at high T-g: and the value is independent of substrate off-angle, On the other hand, homogeneous zigzag steps have emerged on the substrate off toward the [001] azimuth after the growth at high T-g, whereas relatively rough steps were formed on both substrates at low T-g. The results indicate the growth-mode transition from step-flow to facet formation as growth temperature gets higher.
引用
收藏
页码:43 / 48
页数:6
相关论文
共 9 条
[1]   QUANTIZATION OF TERRACE WIDTHS ON VICINAL SI(111) [J].
GOLDBERG, JL ;
WANG, XS ;
WEI, J ;
BARTELT, NC ;
WILLIAMS, ED .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03) :1868-1873
[2]   GROWTH-PROCESS OF III-V-COMPOUND SEMICONDUCTORS BY MIGRATION-ENHANCED EPITAXY [J].
HORIKOSHI, Y ;
YAMAGUCHI, H ;
BRIONES, F ;
KAWASHIMA, M .
JOURNAL OF CRYSTAL GROWTH, 1990, 105 (1-4) :326-338
[3]   CRYSTALLOGRAPHIC SELECTIVE GROWTH OF GAAS BY ATOMIC LAYER EPITAXY [J].
ISSHIKI, H ;
AOYAGI, Y ;
SUGANO, T ;
IWAI, S ;
MEGURO, T .
APPLIED PHYSICS LETTERS, 1993, 63 (11) :1528-1530
[4]   Atomic layer epitaxy of GaAs and GaAsxP1-x on nominally oriented GaAs(111) substrates with high quality surface and interfaces [J].
Lee, JS ;
Iwai, S ;
Isshiki, H ;
Meguro, T ;
Sugano, T ;
Aoyagi, Y .
JOURNAL OF CRYSTAL GROWTH, 1996, 160 (1-2) :21-26
[5]   Multiatomic step formation with excellent uniformity on vicinal (111)A GaAs surfaces by metalorganic vapor-phase epitaxy [J].
Lee, JS ;
Isshiki, H ;
Sugano, T ;
Aoyagi, Y .
JOURNAL OF CRYSTAL GROWTH, 1997, 173 (1-2) :27-32
[6]   STEP BUNCHING ON (111) FACETS IN THE SELECTIVE GROWTH OF GAAS BY METALORGANIC VAPOR-PHASE EPITAXY [J].
NISHIDA, T ;
SHINOHARA, M ;
INOUE, N .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (04) :2854-2856
[7]   DIRECT OBSERVATION OF THE PHASE-TRANSITION BETWEEN THE (7X7) AND (1X1) STRUCTURES OF CLEAN (111) SILICON SURFACES [J].
OSAKABE, N ;
TANISHIRO, Y ;
YAGI, K ;
HONJO, G .
SURFACE SCIENCE, 1981, 109 (02) :353-366
[8]   LOW-ENERGY ELECTRON-MICROSCOPY INVESTIGATIONS OF ORIENTATIONAL PHASE-SEPARATION ON VICINAL SI(111) SURFACES [J].
PHANEUF, RJ ;
BARTELT, NC ;
WILLIAMS, ED ;
SWIECH, W ;
BAUER, E .
PHYSICAL REVIEW LETTERS, 1991, 67 (21) :2986-2989
[9]   SURFACE RECONSTRUCTIONS OF GAAS(111)A AND (111)B - A STATIC SURFACE PHASE STUDY BY REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION [J].
WOOLF, DA ;
WESTWOOD, DI ;
WILLIAMS, RH .
APPLIED PHYSICS LETTERS, 1993, 62 (12) :1370-1372