Three-dimensional morphological instabilities in chemical vapor deposition films

被引：7

作者：

Hwang, CC ^{[1
]}

Yang, HY ^{[1
]}

Hsieh, JY ^{[1
]}

Dai, YM ^{[1
]}

机构：

[1] NAN YA JR COLL,DEPT MECH ENGN,CHUNGLI 32034,TAIWAN

来源：

THIN SOLID FILMS | 1997年 / 304卷 / 1-2期

关键词：

chemical vapor deposition (CVD); diffusion; surface diffusion; surface morphology;

D O I：

10.1016/S0040-6090(97)00192-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this article, an analysis of nonlinear three-dimensional (3-D) morphological instabilities in chemical vapor deposition (CVD) is presented. We establish a set of mathematically governing equation and boundary condition for the system of CVD and derive a weakly nonlinear evolution equation by considering a diffusion-limited growth condition to study the morphological instabilities in the CVD process. This evolution equation not only can predict the behaviors of interfacial growth of films, but can also be a basis of weakly nonlinear analysis. The analysis from critical condition is adopted to investigate the two-dimensional (2-D) band-like cells and the 3-D hexagonal structures. (C) 1997 Elsevier Science S.A.

引用

页码：371 / 380

页数：10

共 15 条

[1] CRITERIA FOR MAKING UNIFORM FILMS BY CHEMICAL VAPOR-DEPOSITION [J].