Optimization of experimental operating parameters for very high resolution focused ion beam applications

被引：28

作者：

Gierak, J

Vieu, C

Schneider, M

Launois, H

Ben Assayag, G

Septier, A

机构：

[1] L2M, CNRS, F-92225 Bagneux, France

[2] CEMES, CNRS, F-31055 Toulouse, France

[3] Conservatoire Natl Arts & Metiers, F-75141 Paris, France

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1997年 / 15卷 / 06期

关键词：

D O I：

10.1116/1.589650

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We report an experimental procedure to optimize the current profile of a focused ion beam probe, with a special emphasis on high resolution applications. The optimized operating conditions are given for three specific cases: specimen thinning for electron microscopy, nanoetching, and nanolithography. We present high quality membranes for transmission electron microscopy, arrays of nanoholes with reproducible dimensions of 17 nm etched on a nickel membrane, and finally nanolithography operations with a 10 nm resolution. Due to the conventional design of our focused ion beam system, the operating conditions that we have established for each nanofabrication application, should be successfully applied to a wide variety of ion columns. (C) 1997 American Vacuum Society.

引用

页码：2373 / 2378

页数：6

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