Static and dynamic charges: Changing perspectives and aims in electron microscopy

被引:12
作者
Howie, A [1 ]
机构
[1] Univ Cambridge, Cavendish Lab, Cambridge CB3 0HE, England
关键词
charging; ESEM; scanning capacitance microscopy; cathodoluminescence;
D O I
10.1017/S1431927604040747
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In the context of electron microscopists' changing attitudes to charging effects, some basic aspects of these phenomenona are surveyed. Methods of mapping internal charge distributions such as doping levels in semiconductors, trap distributions, or internal electric fields in insulators are discussed.
引用
收藏
页码:685 / 690
页数:6
相关论文
共 29 条
[1]  
BARONI TC, 1999, MICROSC MICROANAL S2, V5, P270
[2]   HIGH-RESOLUTION SECONDARY-ELECTRON IMAGING AND SPECTROSCOPY [J].
BLELOCH, AL ;
HOWIE, A ;
MILNE, RH .
ULTRAMICROSCOPY, 1989, 31 (01) :99-110
[3]   Noncontact potentiometry of polymer field-effect transistors [J].
Bürgi, L ;
Sirringhaus, H ;
Friend, RH .
APPLIED PHYSICS LETTERS, 2002, 80 (16) :2913-2915
[4]   Some considerations on the secondary electron emission, δ, from e- irradiated insulators [J].
Cazaux, J .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (02) :1137-1147
[5]  
Doehne Eric, 1998, Microscopy and Microanalysis, V4, P292, DOI 10.1017/S1431927600021589
[6]  
Doehne E., 2001, MICROSC MICROANAL, V7, P780
[7]  
El-Gomati MM, 2001, INST PHYS CONF SER, P489
[8]   Very-low-energy electron microscopy of doped semiconductors [J].
El-Gomati, MM ;
Wells, TCR .
APPLIED PHYSICS LETTERS, 2001, 79 (18) :2931-2933
[9]   Dopant profiling with the scanning electron microscope - A study of Si [J].
Elliott, SL ;
Broom, RF ;
Humphreys, CJ .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (11) :9116-9122
[10]  
GRIFFIN BJ, 1997, MICROSCOPY MICROA S2, V3, P1197