High-resolution synchrotron-radiation photoemission characterization for atomically-controlled SrTiO3(001) substrate surfaces subjected to various surface treatments

被引:43
作者
Kobayashi, D [1 ]
Kumigashira, H
Oshima, M
Ohnishi, T
Lippmaa, M
Ono, K
Kawasaki, M
Koinuma, H
机构
[1] Univ Tokyo, Dept Appl Chem, Tokyo 1138656, Japan
[2] Combinatorial Mat Explorat & Technol, Tsukuba, Ibaraki 3050044, Japan
[3] Univ Tokyo, Inst Solid State Phys, Kashiwa, Chiba 2778581, Japan
[4] KEK, Inst Mat Struct Sci, Tsukuba, Ibaraki 3050801, Japan
[5] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
[6] Tokyo Inst Technol, Mat & Struct Lab, Yokohama, Kanagawa 2268503, Japan
关键词
D O I
10.1063/1.1814175
中图分类号
O59 [应用物理学];
学科分类号
摘要
The chemical properties and electronic structures of atomically flat SrTiO3(001) substrates with various surface treatments have been investigated by high-resolution synchrotron-radiation photoemission spectroscopy. We have found that an annealing process causes the segregation of Sr oxides at the TiO2-terminated surface and that the TiO2-terminated surface is more stable than the SrO terminated one. We demonstrate that the use of chemical etching process is effective as a removal technique for Sr oxides accumulating on TiO2-terminated surfaces and that the adding of a reetching process after annealing in an O-2 environment is one of the best methods to obtain well defined and nearly perfect substrate surface. (C) 2004 American Institute of Physics.
引用
收藏
页码:7183 / 7188
页数:6
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