Piezoresistive effect in metal-semiconductor-metal structures on p-type GaN

被引:27
作者
Gaska, R
Shur, MS
Bykhovski, AD
Yang, JW
Khan, MA
Kaminski, VV
Soloviov, SM
机构
[1] Sensor Elect Technol Inc, Latham, NY 12110 USA
[2] Rensselaer Polytech Inst, Dept Elect Comp & Syst Engn, Troy, NY 12180 USA
[3] Univ S Carolina, Dept Elect & Comp Engn, Columbia, SC 29208 USA
[4] AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia
关键词
D O I
10.1063/1.126833
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on a strong piezoresistive effect in metal-semiconductor-metal structures fabricated on p-type GaN. The maximum measured gauge factor was 260, which is nearly two times larger than for piezoresistive silicon transducers. We attribute this large sensitivity to applied strain to the combination of two mechanisms: (i) a high piezoresistance of bulk p-GaN and (ii) a strong piezoresistive effect in a Schottky contact on p-GaN. The obtained results demonstrate that GaN-based structures can be suitable for stress/pressure sensor applications. (C) 2000 American Institute of Physics. [S0003-6951(00)04826-9].
引用
收藏
页码:3956 / 3958
页数:3
相关论文
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