Deposition of superhard amorphous carbon films by pulsed arc sources

被引：29

作者：

Scheibe, HJ

Schultrich, B

Ziegele, H

Siemroth, P

机构：

[1] Fraunhofer-Institut für Werkstoff- und Strahltechnik

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1997年 / 25卷 / 04期

关键词：

D O I：

10.1109/27.640686

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Hydrogen-free amorphous carbon films with hardness comparable to crystalline superhard materials have been deposited by special pulsed are techniques. With the combination of very high hardness, high smoothness, and low adhesion activity to other materials which are in contact with them, these films show superior behavior in wear and slide applications. The influence of plasma and deposition conditions on these film properties and the choice of optimum conditions are discussed.

引用

收藏

页码：685 / 688

页数：4

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