Contrasting Behavior of Carbon Nucleation in the Initial Stages of Graphene Epitaxial Growth on Stepped Metal Surfaces

被引:201
作者
Chen, Hua [1 ,2 ]
Zhu, Wenguang [1 ,2 ]
Zhang, Zhenyu [1 ,2 ,3 ]
机构
[1] Univ Tennessee, Dept Phys & Astron, Knoxville, TN 37996 USA
[2] Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA
[3] Univ Sci & Technol China, ICQD, Hefei 230026, Anhui, Peoples R China
基金
美国国家科学基金会;
关键词
AUGMENTED-WAVE METHOD; RU(0001);
D O I
10.1103/PhysRevLett.104.186101
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Using first-principles calculations within density functional theory, we study the energetics and kinetics of C nucleation in the early stages of epitaxial graphene growth on three representative stepped metal surfaces: Ir(111), Ru(0001), and Cu(111). We find that on the flat surfaces of Ir(111) and Ru(0001), two C atoms repel each other, while they prefer to form a dimer on Cu(111). Moreover, the step edges on Ir and Ru surfaces cannot serve as effective trapping centers for single C adatoms, but can readily facilitate the formation of C dimers. These contrasting behaviors are attributed to the delicate competition between C-C bonding and C-metal bonding, and a simple generic principle is proposed to predict the nucleation sites of C adatoms on many other metal substrates with the C-metal bond strengths as the minimal inputs.
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页数:4
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