Time-resolved photoluminescence study of hydrogenated amorphous silicon nitride

被引:23
作者
Seol, KS
Watanabe, T
Fujimaki, M
Kato, H
Ohki, Y
Takiyama, M
机构
[1] RIKEN, Inst Phys & Chem Res, Wako, Saitama 3510198, Japan
[2] Waseda Univ, Dept Elect Elect & Comp Engn, Shinjuku Ku, Tokyo 1698555, Japan
[3] NSC Electron Corp, Yamaguchi 7430063, Japan
来源
PHYSICAL REVIEW B | 2000年 / 62卷 / 03期
关键词
D O I
10.1103/PhysRevB.62.1532
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Time-resolved measurements of photoluminescence were carried out on a hydrogenated amorphous silicon nitride film prepared by low-pressure chemical vapor deposition. When excited with 5.0-eV photons, photoluminescence occurs over a broad spectrum ranging from 1.8 to 3.6 eV. The peak energy of this photoluminescence varies with time from several nanoseconds to nearly 1 ms. These results are explained by a combination of an excitonlike recombination process and a radiative tunneling recombination process of photogenerated carriers within the band-tail states, which are affected by the contributions of thermalization, the Coulombic interaction, and the extent of localization.
引用
收藏
页码:1532 / 1535
页数:4
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