Recent Progress in n-Channel Organic Thin-Film Transistors

被引:276
作者
Wen, Yugeng [1 ,2 ]
Liu, Yunqi [1 ]
机构
[1] Chinese Acad Sci, Beijing Natl Lab Mol Sci, Key Lab Organ Solids, Inst Chem, Beijing 100190, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China
基金
中国国家自然科学基金;
关键词
FIELD-EFFECT TRANSISTORS; HIGH-ELECTRON-MOBILITY; SELF-ASSEMBLED MONOLAYERS; GEL GATE DIELECTRICS; HIGH-PERFORMANCE; COMPLEMENTARY CIRCUITS; DIIMIDE SEMICONDUCTORS; CHARGE-TRANSPORT; CONTACT RESISTANCE; TRIFLUOROMETHYLPHENYL GROUPS;
D O I
10.1002/adma.200901454
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Particular attention has been focused on n-channel thin-film transistors (OTFTs) during the last few years the potentially cost-effective circuitry-based applications in flexible electronics, such as flexible radio-frequency identity tags, smart labels, and simple displays, will benefit from this fast development. This article reviews recent progress in performance and molecular design of n-channel semiconductors in the past five years, and limitations and practicable solutions for n-channel OTFTs are dealt with from the viewpoint of OTFT constitution and geometry, molecular design, and thin-film growth conditions. Strategy methodology is especially highlighted with an aim to investigate basic issues in this field.
引用
收藏
页码:1331 / 1345
页数:15
相关论文
共 129 条
[11]   Improved air stability of n-channel organic thin-film transistors with surface modification on gate dielectrics [J].
Chen, Fang-Chung ;
Liao, Cheng-Hsiang .
APPLIED PHYSICS LETTERS, 2008, 93 (10)
[12]   One-pot [1+1+1] synthesis of dithieno[2,3-b:3′,2′-d]thiophene (DTT) and their functionalized derivatives for organic thin-film transistors [J].
Chen, Ming-Chou ;
Chiang, Yen-Ju ;
Kim, Choongik ;
Guo, Yue-Jhih ;
Chen, Sheng-Yu ;
Liang, You-Jhih ;
Huang, Yu-Wen ;
Hu, Tarng-Shiang ;
Lee, Gene-Hsiang ;
Facchetti, Antonio ;
Marks, Tobin J. .
CHEMICAL COMMUNICATIONS, 2009, (14) :1846-1848
[13]   Naphthalenedicarboximide- vs Perylenedicarboximide-Based Copolymers. Synthesis and Semiconducting Properties in Bottom-Gate N-Channel Organic Transistors [J].
Chen, Zhihua ;
Zheng, Yan ;
Yan, He ;
Facchetti, Antonio .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2009, 131 (01) :8-+
[14]   Variable temperature film and contact resistance measurements on operating n-channel organic thin film transistors [J].
Chesterfield, RJ ;
McKeen, JC ;
Newman, CR ;
Frisbie, CD ;
Ewbank, PC ;
Mann, KR ;
Miller, LL .
JOURNAL OF APPLIED PHYSICS, 2004, 95 (11) :6396-6405
[15]   Organic thin film transistors based on N-alkyl perylene diimides:: Charge transport kinetics as a function of gate voltage and temperature [J].
Chesterfield, RJ ;
McKeen, JC ;
Newman, CR ;
Ewbank, PC ;
da Silva, DA ;
Brédas, JL ;
Miller, LL ;
Mann, KR ;
Frisbie, CD .
JOURNAL OF PHYSICAL CHEMISTRY B, 2004, 108 (50) :19281-19292
[16]   Solution-processed n-type organic thin-film transistors with high field-effect mobility [J].
Chikamatsu, M ;
Nagamatsu, S ;
Yoshida, Y ;
Saito, K ;
Yase, K ;
Kikuchi, K .
APPLIED PHYSICS LETTERS, 2005, 87 (20) :1-3
[17]   High-Performance n-Type Organic Thin-Film Transistors Based on Solution-Processable Perfluoroalkyl-Substituted C60 Derivatives [J].
Chikamatsu, Masayuki ;
Itakura, Atsushi ;
Yoshida, Yuji ;
Azumi, Reiko ;
Yase, Kiyoshi .
CHEMISTRY OF MATERIALS, 2008, 20 (24) :7365-7367
[18]   Printable ion-gel gate dielectrics for low-voltage polymer thin-film transistors on plastic [J].
Cho, Jeong Ho ;
Lee, Jiyoul ;
Xia, Yu ;
Kim, Bongsoo ;
He, Yiyong ;
Renn, Michael J. ;
Lodge, Timothy P. ;
Frisbie, C. Daniel .
NATURE MATERIALS, 2008, 7 (11) :900-906
[19]   High-capacitance ion gel gate dielectrics with faster polarization response times for organic thin film transistors [J].
Cho, Jeong Ho ;
Lee, Jiyoul ;
He, Yiyong ;
Kim, BongSoo ;
Lodge, Timothy P. ;
Frisbie, C. Daniel .
ADVANCED MATERIALS, 2008, 20 (04) :686-+
[20]   Enhanced Performance of Fullerene n-Channel Field-Effect Transistors with Titanium Sub-Oxide Injection Layer [J].
Cho, Shinuk ;
Seo, Jung Hwa ;
Lee, Kwanghee ;
Heeger, Alan J. .
ADVANCED FUNCTIONAL MATERIALS, 2009, 19 (09) :1459-1464