Dynamic shadow mask technique: A universal tool for nanoscience

被引：75

作者：

Egger, S ^{[1
]}

Ilie, A ^{[1
]}

Fu, YT ^{[1
]}

Chongsathien, J ^{[1
]}

Kang, DJ ^{[1
]}

Welland, ME ^{[1
]}

机构：

[1] Univ Cambridge, Cambridge CB3 0FF, England

来源：

NANO LETTERS | 2005年 / 5卷 / 01期

关键词：

D O I：

10.1021/nl0486822

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A comprehensive instrument, designed for fabricating nanostructures by evaporation through a dynamic shadow mask in ultrahigh vacuum, is described. The versatility and performance of the instrument is demonstrated through a series of examples, allowing for applications that are impossible to achieve with traditional nanopatterning methods. Clean nanostructures or entire devices made of different materials and on various substrates can be fabricated. The technique is compatible with fundamental surface science and can be easily interfaced with other fabrication and characterization techniques.

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收藏

页码：15 / 20

页数：6

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