Depletion-mode ZnO nanowire field-effect transistor

被引:223
作者
Heo, YW [1 ]
Tien, LC
Kwon, Y
Norton, DP
Pearton, SJ
Kang, BS
Ren, F
机构
[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[2] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.1794351
中图分类号
O59 [应用物理学];
学科分类号
摘要
Single ZnO nanowire metal-oxide-semiconductor field-effect transistors (MOSFETs) were fabricated using nanowires grown by site selective molecular-beam epitaxy. When measured in the dark at 25degreesC, he depletion-mode transistors exhibit good saturation behavior, a threshold voltage of similar to-3 V, and a maximum transconductance of order 0.3 mS/mm. Under ultraviolet (366 nm) illumination, the drain-source current increase by approximately a factor of 5 and the maximum transconductance is similar to5 mS/mm. The channel mobility is estimated to be similar to3 cm(2)/V s, which is comparable to that reported for thin film ZnO enhancement mode MOSFETs, and the on/off ratio was similar to25 in the dark and similar to125 under UV illumination. (C) 2004 American Institute of Physics.
引用
收藏
页码:2274 / 2276
页数:3
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