共 12 条
[1]
BANINE V, 1999, IN PRESS P MNE
[2]
BENSCHOP JP, 2000, IN PRESS P SPIE
[3]
EUCLIDES, the European EUVL program
[J].
EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2,
1999, 3676
:246-252
[4]
GWYN C, 1998, EUV LLC WHITE PAPER
[5]
GWYN CW, 1999, EUV WHITE PAPER
[6]
MCGEOCH M, 1998, APPL OPTICS, V37
[7]
EUV (13.5nm) light generation using a Dense Plasma Focus device
[J].
EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2,
1999, 3676
:846-858
[8]
High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography
[J].
EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2,
1999, 3676
:272-275
[9]
Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1999, 17 (06)
:2998-3002
[10]
TAYLOR J, 1999, IN PRESS J VAC S DEC