Effects of channel-length scaling on In2O3 nanowire field effect transistors studied by conducting atomic force microscopy

被引:25
作者
Jo, Gunho [1 ]
Maeng, Jongsun [1 ]
Kim, Tae-Wook [1 ]
Hong, Woong-Ki [1 ]
Jo, Minseok [1 ]
Hwang, Hyunsang [1 ]
Lee, Takhee [1 ]
机构
[1] Gwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea
关键词
D O I
10.1063/1.2728754
中图分类号
O59 [应用物理学];
学科分类号
摘要
Scaling effects of In2O3 nanowire field effect transistors (FETs) were examined as a function of channel length. The channel length was varied from 1 mu m to 20 nm by placing a conducting atomic force microscope tip on the In2O3 nanowire as a movable contact. The In2O3 nanowire FET exhibited a variety of channel-length dependent transfer characteristics in terms of the source-drain current, transconductance, threshold voltage, and mobility. Furthermore, the authors were able to extract the contact resistance and distinguish between apparent mobility and intrinsic mobility. The latter was corrected, taking into account the non-negligible contact resistance for short channel devices. (c) 2007 American Institute of Physics.
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页数:3
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