Synthesis and characterization of nano-crystalline CVD diamond film on pure titanium using Ar/CH4/H2 gas mixture

被引：30

作者：

Askari, S. J. ^{[1
]}

Akhtar, F. ^{[1
]}

Chen, G. C. ^{[1
]}

He, Q. ^{[1
]}

Wang, F. Y. ^{[1
]}

Meng, X. M. ^{[1
]}

Lu, F. X. ^{[1
]}

机构：

[1] Univ Sci & Technol Beijing, Sch Mat Sci & Engn, Dept High Tech Thin Films, Beijing 100083, Peoples R China

来源：

MATERIALS LETTERS | 2007年 / 61卷 / 11-12期

基金：

中国国家自然科学基金;

关键词：

chemical vapor deposition; nano-crystalline diamond thin film; tribology; pure titanium substrate;

D O I：

10.1016/j.matlet.2006.08.033

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium and Ti alloys have poor tribological properties and deposition of a well adherent diamond coating is a promising way to solve this problem. But diamond film deposition on pure titanium and Ti alloys is always difficult due to the high diffusion coefficient of carbon in Ti, the large mismatch in their thermal expansion coefficients, the complex nature of the interlayer formed during diamond deposition, and the difficulty of achieving very high nucleation density. A nano-crystalline diamond (NCD) film can resolve Ti and Ti alloys weak tribological performance due to its smooth surface. A well-adhered NCD film was successfully deposited on pure Ti substrate by using a microwave plasma assisted chemical vapor deposition (M\ATCVD) system in the environment of Ar, CH4 and H-2 gases at a moderate temperature. Detailed experimental results on the preparation, characterization and successful deposition of the NCD film on pure Ti are discussed. (c) 2006 Elsevier B.V All rights reserved.

引用

页码：2139 / 2142

页数：4

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