0.5-W single transverse-mode operation of an 850-nm diode-pumped surface-emitting semiconductor laser

被引:108
作者
Hastie, JE [1 ]
Hopkins, JM
Calvez, S
Jeon, CW
Burns, D
Abram, R
Riis, E
Ferguson, AI
Dawson, MD
机构
[1] Univ Strathclyde, Inst Photon, Glasgow G4 0NW, Lanark, Scotland
[2] Univ Strathclyde, Dept Phys, Glasgow G4 0NG, Lanark, Scotland
关键词
high power; thermal management; vertical external-cavity surface-emitting laser (VECSEL); HIGH-POWER;
D O I
10.1109/LPT.2003.813446
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the power scaling of a diode-pumped GaAs-based 850-nm vertical external-cavity surface-emitting laser, by use of an intracavity. silicon carbide (SiC) heatspreader optically contacted to the semiconductor surface. To our knowledge, this is the first demonstration of bonding of SiC to a III-V semiconductor structure using the technique of liquid capillarity. High output power of >0.5 W in a circularly symmetric, TEMoo output beam has been achieved with a spectral shift of only 0.6 nm/W of pump power. No thermal rollover was evident up to the highest pump power available, implying significant further output-power scaling potential using this approach.
引用
收藏
页码:894 / 896
页数:3
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