A comparison of in situ polishing and ion beam sputtering as surface preparation methods for XPS analysis of PVD coatings

被引：28

作者：

Baker, MA ^{[1
]}

Greaves, SJ

Wendler, E

Fox, V

机构：

[1] Univ Surrey, Sch Mech & Mat Engn, Guildford GU2 5XH, Surrey, England

[2] Univ Surrey, Sch Elect Engn Informat Technol & Math, Guildford GU2 5XH, Surrey, England

[3] Teer Coatings Ltd, Kidderminster DY10 4JB, Worcs, England

来源：

THIN SOLID FILMS | 2000年 / 377卷 / 377-378期

关键词：

XPS; in situ polishing; sputtering; PVD coatings;

D O I：

10.1016/S0040-6090(00)01272-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

XPS measurements have been performed on three coatings, TiN, TiAlN and MOST (MoS2 + Ti), in which the surface oxide is removed by in situ UHV mechanical polishing. Examination of the XPS core level lineshape, before and after cleaning, shows in situ polishing to be a successful method of removing the surface oxide and exposing the bulk. A comparison of data obtained by RES and XPS from both a mechanically polished surface and an ion beam cleaned surface demonstrated that mechanically cleaned surfaces gave reliable compositions. Severe preferential sputtering is observed for the MOST coating and mechanical polishing is shown to be an excellent method to prepare the coating for analysis by electron spectroscopic methods. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：473 / 477

页数：5

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