Ion energy uniformity in high-frequency capacitive discharges

被引:88
作者
Perret, A [1 ]
Chabert, P [1 ]
Jolly, J [1 ]
Booth, JP [1 ]
机构
[1] Ecole Polytech, Lab Phys & Technol Plasmas, F-91128 Palaiseau, France
关键词
D O I
10.1063/1.1848183
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ion energy distribution functions and ion fluxes in low-pressure, high-frequency (13.56-80 MHz) capacitive discharges were investigated both theoretically and experimentally. In most of the conditions explored, the ion energy distribution function was a single peak centered at the time-averaged plasma potential. Lower energy ions with higher fluxes are obtained as the frequency increases. The uniformity of the ion energy across large-area electrodes (40 cm(2)) was also studied in conditions under which the standing wave effect is important, i.e., conditions such that the rf voltage and the ion flux are strongly nonuniform. Unlike the latter quantities, the ion energy was uniform across the reactor at all frequencies, due to dc current flowing radially in the plasma and in the electrodes. (C) 2005 American Institute of Physics.
引用
收藏
页码:021501 / 1
页数:3
相关论文
共 13 条
[1]  
BOHM C, 1993, REV SCI INSTRUM, V64, P31, DOI 10.1063/1.1144398
[2]   Suppression of the standing wave effect in high frequency capacitive discharges using a shaped electrode and a dielectric lens: Self-consistent approach [J].
Chabert, P ;
Raimbault, JL ;
Rax, JM ;
Perret, A .
PHYSICS OF PLASMAS, 2004, 11 (08) :4081-4087
[3]   Self-consistent nonlinear transmission line model of standing wave effects in a capacitive discharge [J].
Chabert, P ;
Raimbault, JL ;
Rax, JM ;
Lieberman, MA .
PHYSICS OF PLASMAS, 2004, 11 (05) :1775-1785
[4]   Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma [J].
Kitajima, T ;
Takeo, Y ;
Petrovic, ZL ;
Makabe, T .
APPLIED PHYSICS LETTERS, 2000, 77 (04) :489-491
[5]   Standing wave and skin effects in large-area, high-frequency capacitive discharges [J].
Lieberman, MA ;
Booth, JP ;
Chabert, P ;
Rax, JM ;
Turner, MM .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (03) :283-293
[6]  
LIEBERMAN MA, 1994, PRINCIPLES RADIOFREQ
[7]   Ion flux nonuniformities in large-area high-frequency capacitive discharges [J].
Perret, A ;
Chabert, P ;
Booth, JP ;
Jolly, J ;
Guillon, J ;
Auvray, P .
APPLIED PHYSICS LETTERS, 2003, 83 (02) :243-245
[8]   Analytical model of a dual frequency capacitive sheath [J].
Robiche, J ;
Boyle, PC ;
Turner, MM ;
Ellingboe, AR .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2003, 36 (15) :1810-1816
[9]   Systematic characterization of low-pressure capacitively coupled hydrogen discharges [J].
Salabas, A ;
Marques, L ;
Jolly, J ;
Gousset, G ;
Alves, LL .
JOURNAL OF APPLIED PHYSICS, 2004, 95 (09) :4605-4620
[10]   Shaped electrode and lens for a uniform radio-frequency capacitive plasma [J].
Sansonnens, L ;
Schmitt, J .
APPLIED PHYSICS LETTERS, 2003, 82 (02) :182-184