Electronic structure of GaN nanowire studied by x-ray-absorption spectroscopy and scanning photoelectron microscopy

被引:38
作者
Chiou, JW
Jan, JC
Tsai, HM
Pong, WF [1 ]
Tsai, MH
Hong, IH
Klauser, R
Lee, JF
Hsu, CW
Lin, HM
Chen, CC
Shen, CH
Chen, LC
Chen, KH
机构
[1] Tamkang Univ, Dept Phys, Tamsui 251, Taiwan
[2] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 804, Taiwan
[3] Natl Synchrotron Radiat Res Ctr, Hsinchu 300, Taiwan
[4] Natl Taiwan Normal Univ, Dept Chem, Taipei 106, Taiwan
[5] Acad Sinica, Inst Atom & Mol Sci, Taipei 106, Taiwan
[6] Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 106, Taiwan
关键词
D O I
10.1063/1.1579871
中图分类号
O59 [应用物理学];
学科分类号
摘要
X-ray absorption near edge structure (XANES) and scanning photoelectron microscopy (SPEM) measurements have been employed to obtain information on the electronic structures of the GaN nanowires and thin film. The comparison of the XANES spectra revealed that the nanowires have a smaller (larger) N (Ga) K edge XANES intensity than that of the thin film, which suggests an increase (decrease) of the occupation of N2p (Ga4p) orbitals and an increase of the N (Ga) negative (positive) effective charge in the nanowires. The SPEM spectra showed that the Ga3d band for the nanowires lies about 20.8 eV below the Fermi level and has a chemical shift of about -0.9 eV relative to that of the thin film. (C) 2003 American Institute of Physics.
引用
收藏
页码:3949 / 3951
页数:3
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