Reinvestigation of the Ni/Si interface: Spectromicroscopic evidence for multiple silicide phases

被引：20

作者：

Gregoratti, L ^{[1
]}

Gunther, S ^{[1
]}

Kovac, J ^{[1
]}

Casalis, L ^{[1
]}

Marsi, M ^{[1
]}

Kiskinova, M ^{[1
]}

机构：

[1] Sincrotrone Trieste, I-34012 Trieste, Italy

来源：

PHYSICAL REVIEW B | 1998年 / 57卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.57.R6799

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Using photoelectron spectromicroscopy we identified the chemical composition of several phases on a morphologically complex interface formed after segregation of dissolved Ni onto the Si(111) surface. Unexpectedly, coexistence of two types of micrometer-sized silicide islands with composition and electronic structure close to NiSi2 and NiSi phases was found. This finding revises some of the previous schemes about the evolution of the Ni/Si(111) system at high temperatures, which were based exclusively on structural analyses. A formation mechanism supposing anisotropy of the nucleation barrier far disilicide formation is suggested in order to explain the presence of NiSi islands and the preferred [110] orientation of the NiSi2 islands.

引用

页码：R6799 / R6802

页数：4

共 20 条

[1] SURFACE PHASE-TRANSFORMATIONS IN THE NI/SI(111) SYSTEM OBSERVED IN REAL-TIME USING LOW-ENERGY-ELECTRON MICROSCOPY [J].