EVIDENCE FOR SI DIFFUSION THROUGH EPITAXIAL NISI2 GROWN ON SI(111)

被引：40

作者：

HINKEL, V ^{[1
]}

SORBA, L ^{[1
]}

HAAK, H ^{[1
]}

HORN, K ^{[1
]}

BRAUN, W ^{[1
]}

机构：

[1] BESSY GMBH,D-1000 BERLIN 33,FED REP GER

来源：

APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 18期

关键词：

D O I：

10.1063/1.97927

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：1257 / 1259

页数：3

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