DIFFUSION-LAYER MICROSTRUCTURE OF NI ON SI(100)

被引：66

作者：

CHANG, YJ

ERSKINE, JL

机构：

来源：

PHYSICAL REVIEW B | 1982年 / 26卷 / 08期

关键词：

D O I：

10.1103/PhysRevB.26.4766

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：4766 / 4769

页数：4

共 16 条

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