C2 column densities in H2/Ar/CH4 microwave plasmas

被引:29
作者
Goyette, AN
Matsuda, Y
Anderson, LW
Lawler, JE
机构
[1] Univ Wisconsin, Dept Phys, Madison, WI 53706 USA
[2] Nagasaki Univ, Dept Comp Sci & Elect Engn, Nagasaki 852, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1998年 / 16卷 / 01期
关键词
D O I
10.1116/1.580992
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report the observation of the d (IIg)-I-3 --> a (IIu)-I-3 Swan bands of the C-2 molecule both in absorption and emission in a H-2/Ar/CH4 microwave discharge plasma. The input mole fraction of methane is varied from 1% to 33%. From the observed absorptions, we calculate the column density of gas phase C-2. The calculated concentration of C-2 is higher in discharges containing large fractions of argon than in discharges containing large fractions of hydrogen. These observations are useful in understanding the contribution of the C-2 molecule to the gas phase chemistry of the microwave plasma-assisted chemical vapor deposition of diamond. (C) 1998 American Vacuum Society.
引用
收藏
页码:337 / 340
页数:4
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