Polymer viscoelasticity and residual stress effects on nanoimprint lithography

被引:69
作者
Ding, Yifu
Ro, Hyun Wook
Douglas, Jack F.
Jones, Ronald L.
Hine, Daniel R.
Karim, Alamgir
Soles, Christopher L.
机构
[1] Natl Inst Stand & Technol, Div Polymers, Gaithersburg, MD 20899 USA
[2] Univ Maryland, Lab Phys Sci, College Pk, MD 20740 USA
关键词
D O I
10.1002/adma.200601998
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The decay kinetics of polystyrene (PS) gratings are monitored by tracking the intensity of the first-order laser diffraction peak as a function of annealing time. For low-molecular-mass PS (24 kg mol(-1), blue circles), an exponential response suggests that the pattern decay is a surface-tension driven viscous flow. In high-molecular-mass PS (1007 kg mol(-1), green circles) a complicated response includes a rapid elastic recovery, a power-law creep, and a viscouslike flow (see figure).
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页码:1377 / +
页数:7
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