Biaxially stretchable "Wavy" silicon nanomembranes

被引:327
作者
Choi, Won Mook
Song, Jizhou
Khang, Dahl-Young
Jiang, Hanqing
Huang, Yonggang Y.
Rogers, John A. [1 ]
机构
[1] Univ Illinois, Dept Mat Sci & Engn, Dept Chem, Beckman Inst Adv Sci & Technol, Urbana, IL 61801 USA
[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
[3] Arizona State Univ, Dept Mech & Aerosp Engn, Tempe, AZ 85287 USA
[4] Univ Illinois, Dept Mech Sci & Engn, Urbana, IL 61801 USA
关键词
D O I
10.1021/nl0706244
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
This Letter introduces a biaxially stretchable form of single crystalline silicon that consists of two dimensionally buckled, or "wavy", silicon nanomembranes on elastomeric supports. Fabrication procedures for these structures are described, and various aspects of their geometries and responses to uniaxial and biaxial strains along various directions are presented. Analytical models of the mechanics of these systems provide a framework for quantitatively understanding their behavior. These classes of materials might be interesting as a route to high-performance electronics with full, two-dimensional stretchability.
引用
收藏
页码:1655 / 1663
页数:9
相关论文
共 25 条
[1]   Conformal contact and pattern stability of stamps used for soft lithography [J].
Bietsch, A ;
Michel, B .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (07) :4310-4318
[2]   High-frequency ultrasound array element using thermoelastic expansion in an elastomeric film [J].
Buma, T ;
Spisar, M ;
O'Donnell, M .
APPLIED PHYSICS LETTERS, 2001, 79 (04) :548-550
[3]   A family of herringbone patterns in thin films [J].
Chen, X ;
Hutchinson, JW .
SCRIPTA MATERIALIA, 2004, 50 (06) :797-801
[4]   Decal transfer microlithography: A new soft-lithographic patterning method [J].
Childs, WR ;
Nuzzo, RG .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2002, 124 (45) :13583-13596
[5]   Surface modification of Sylgard-184 poly(dimethyl siloxane) networks by ultraviolet and ultraviolet/ozone treatment [J].
Efimenko, K ;
Wallace, WE ;
Genzer, J .
JOURNAL OF COLLOID AND INTERFACE SCIENCE, 2002, 254 (02) :306-315
[6]   Nanoscale hydrophobic recovery:: A chemical force microscopy study of UV/ozone-treated cross-linked poly(dimethylsiloxane) [J].
Hillborg, H ;
Tomczak, N ;
Olàh, A ;
Schönherr, H ;
Vancso, GJ .
LANGMUIR, 2004, 20 (03) :785-794
[7]   Effects of mechanical strain on TFTs on spherical domes [J].
Hsu, PHI ;
Huang, M ;
Gleskova, H ;
Xi, Z ;
Suo, Z ;
Wagner, S ;
Sturm, JC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2004, 51 (03) :371-377
[8]   Nonlinear analyses of wrinkles in a film bonded to a compliant substrate [J].
Huang, ZY ;
Hong, W ;
Suo, Z .
JOURNAL OF THE MECHANICS AND PHYSICS OF SOLIDS, 2005, 53 (09) :2101-2118
[9]  
*INSPEC, 1998, PROP SIL, P92904
[10]   Flexible electronics and displays: High-resolution, roll-to-roll, projection lithography and photoablation processing technologies for high-throughput production [J].
Jain, K ;
Klosner, M ;
Zemel, M ;
Raghunandan, S .
PROCEEDINGS OF THE IEEE, 2005, 93 (08) :1500-1510