Long- and short-period nanostructure formation on semiconductor surfaces at different ambient conditions

被引:32
作者
Ganeev, R. A. [1 ,2 ,3 ]
Baba, M. [1 ,4 ]
Ozaki, T. [2 ]
Kuroda, H. [1 ,4 ]
机构
[1] Univ Tokyo, Inst Solid State Phys, Chiba 2778581, Japan
[2] Ctr Energie Mat & Telecommun, Inst Natl Rech Sci, Varennes, PQ J3X 1S2, Canada
[3] Uzbek Acad Sci, Inst Elect, Tashkent 100125, Uzbekistan
[4] Saitama Med Univ, Fac Med, Iruma, Saitama 3500495, Japan
关键词
FEMTOSECOND LASER-ABLATION; DAMAGE; SILICON; FABRICATION; PULSES; SI;
D O I
10.1364/JOSAB.27.001077
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We present the results of studies of nanoripples formation during interaction of the 800 nm, 120, and 35 fs pulses with semiconductor surfaces. Simultaneous appearance of the ripples with the period (700 nm) close to the wavelength of interacting radiation and considerably smaller period (180 nm) was achieved. We discuss the experimental conditions for the formation of these nanoripples (incidence angle, polarization, number of shots, etc.). We show a decisive role of surrounding medium on the quality of nanoripples formation. The self-organization of high-quality nanoripples was clearly shown in the case of dense surrounding medium ( methanol), while in the case of insufficient amount of surrounding material (i.e., at different vacuum conditions), the quality of ripples considerably decreased. (C) 2010 Optical Society of America
引用
收藏
页码:1077 / 1082
页数:6
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