Optimizing and quantifying dopant mapping using a scanning electron microscope with a through-the-lens detector

被引:35
作者
Schönjahn, C
Broom, RF
Humphreys, CJ
Howie, A
Mentink, SAM
机构
[1] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
[2] Univ Cambridge, Cavendish Lab, Cambridge CB3 0HE, England
[3] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
关键词
D O I
10.1063/1.1592302
中图分类号
O59 [应用物理学];
学科分类号
摘要
Although dopant contrast in the scanning electron microscope has been known for a long time, its quantification is still a matter of debate mainly due to the lack of understanding of the contrast mechanism. Here we show that dopant contrast can be usefully increased at low extraction voltages. The effect may be related to the different angular and energy distribution of secondary electrons emitted from the p and n regions and for quantitative work should be studied over the full range of extraction potential. (C) 2003 American Institute of Physics.
引用
收藏
页码:293 / 295
页数:3
相关论文
共 10 条
[1]   Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging [J].
Castell, MR ;
Simpson, TW ;
Mitchell, IV ;
Perovic, DD ;
Baribeau, JM .
APPLIED PHYSICS LETTERS, 1999, 74 (16) :2304-2306
[2]   ELECTRON BEAM INDUCED POTENTIAL CONTRAST ON UNBIASED PLANAR TRANSISTORS [J].
CHANG, THP ;
NIXON, WC .
SOLID-STATE ELECTRONICS, 1967, 10 (07) :701-&
[3]   SIMPLE CALCULATION OF ENERGY-DISTRIBUTION OF LOW-ENERGY SECONDARY ELECTRONS EMITTED FROM METALS UNDER ELECTRON-BOMBARDMENT [J].
CHUNG, MS ;
EVERHART, TE .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (02) :707-709
[4]   Dopant profiling with the scanning electron microscope - A study of Si [J].
Elliott, SL ;
Broom, RF ;
Humphreys, CJ .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (11) :9116-9122
[5]  
Howie A, 2000, MICROSC MICROANAL, V6, P291
[6]   FIELD-EMISSION SEM IMAGING OF COMPOSITIONAL AND DOPING LAYER SEMICONDUCTOR SUPERLATTICES [J].
PEROVIC, DD ;
CASTELL, MR ;
HOWIE, A ;
LAVOIE, C ;
TIEDJE, T ;
COLE, JSW .
ULTRAMICROSCOPY, 1995, 58 (01) :104-113
[7]   Energy-filtered imaging in a field-emission scanning electron microscope for dopant mapping in semiconductors [J].
Schönjahn, C ;
Humphreys, CJ ;
Glick, M .
JOURNAL OF APPLIED PHYSICS, 2002, 92 (12) :7667-7671
[8]   Mechanism for secondary electron dopant contrast in the SEM [J].
Sealy, CP ;
Castell, MR ;
Wilshaw, PR .
JOURNAL OF ELECTRON MICROSCOPY, 2000, 49 (02) :311-321
[9]   Mapping electrically active dopant profiles by field-emission scanning electron microscopy [J].
Turan, R ;
Perovic, DD ;
Houghton, DC .
APPLIED PHYSICS LETTERS, 1996, 69 (11) :1593-1595
[10]   Secondary electron imaging as a two-dimensional dopant profiling technique: Review and update [J].
Venables, D ;
Jain, H ;
Collins, DC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (01) :362-366