A "molecular eraser" for dip-pen nanolithography

被引：29

作者：

Jang, Jae-Won

Maspoch, Daniel

Fujigaya, Tszcyohiko

Mirkin, Chad A.

机构：

[1] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA

[2] Northwestern Univ, Int Inst Nanotechnol, Evanston, IL 60208 USA

来源：

SMALL | 2007年 / 3卷 / 04期

关键词：

alkanethiols; atomic force microscopy; dip-pen nanolithography; self-assembled monolayers;

D O I：

10.1002/smll.200600679

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

An erasing method for repairing defective nanostructures generated in a dip-pen nanolithography (DPN) using conductive tip and conductive atomic force microscope (c-AFM) to electrochemically induce desorption is described. c-AFM would be used to selectively desorb portions of a monolayer-based structure made by DPN with alkanethiol inks on gold. c-AFM is used to selectively control the elimination of 16-mercaptohexadecanoic acid (MHA) nanostructures. This erasing technique can be coupled with DPN, and the eliminated MHA features can be backfilled with a new ink by simply coating the cantilever with the desired molecule. This procedure results in the elimination of the MHA-based triangle and replacement with a 11-ferrocenyl-1-undecanethiol (FUT) based compound without a damage to the 1-octadecanethiol (ODT)-coated regions of the substrate.

引用

收藏

页码：600 / 605

页数：6

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