Nanopatterning of alkyl monolayers covalently bound to Si(111) with an atomic force microscope

被引:66
作者
Ara, M [1 ]
Graaf, H
Tada, H
机构
[1] Grad Univ Adv Studies, Dept Funct Mol Sci, Okazaki, Aichi 4448585, Japan
[2] Okazaki Natl Res Inst, Inst Mol Sci, Okazaki, Aichi 4448585, Japan
关键词
D O I
10.1063/1.1467973
中图分类号
O59 [应用物理学];
学科分类号
摘要
Alkyl monolayers covalently bound to silicon were prepared through the reaction between 1-alkene molecules and hydrogen-terminated Si. The surfaces were anodized in nanometer scale with a contact-mode atomic force microscope (AFM) by applying positive bias voltage to the surface with respect to a conducting cantilever under ambient conditions. Following the anodization, patterned areas were selectively modified by chemical etching and coating with different molecules. The alkyl monolayers showed high resistance against chemical etching and protected Si surfaces from oxidation. AFM lithography of monolayers on Si was found to be useful for nanofabrication of organic/inorganic interfaces based on the Si-C covalent bond. (C) 2002 American Institute of Physics.
引用
收藏
页码:2565 / 2567
页数:3
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