FABRICATION OF NANOMETER-SCALE STRUCTURES USING ATOMIC-FORCE MICROSCOPE WITH CONDUCTING PROBE

被引：68

作者：

HATTORI, T ^{[1
]}

EJIRI, Y ^{[1
]}

SAITO, K ^{[1
]}

YASUTAKE, M ^{[1
]}

机构：

[1] SEIKO INSTRUMENTS INC, DEPT DEV, DIV SCI INSTRUMENTS, TAKATSUKA UNIT, MATSUDO, CHIBA 271, JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1994年 / 12卷 / 04期

关键词：

D O I：

10.1116/1.579062

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Nanometer-scale structures were fabricated using electric field enhanced oxidation using an atomic force microscope with a conducting probe. The dependencies of thicknesses and widths of oxide stripes on applied voltage and time during which voltage is applied, were investigated. Also, the dependencies of depths of trenches, which are fabricated on the silicon surface by removing oxide stripes, on applied voltage and time during which voltage is applied, were investigated. The oxidation mechanism is discussed based on these investigations.

引用

页码：2586 / 2590

页数：5

共 14 条

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