High-resolution soft lithography: Enabling materials for nanotechnologies

被引：240

作者：

Rolland, JP

Hagberg, EC

Denison, GM

Carter, KR

DeSimone, JM

机构：

[1] IBM Corp, Almaden Res Ctr, Ctr Polymer Interfaces & Macromol Assemblies, San Jose, CA 95120 USA

[2] N Carolina State Univ, Dept Chem, Raleigh, NC 27695 USA

[3] N Carolina State Univ, Dept Chem Engn, Raleigh, NC 27695 USA

来源：

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION | 2004年 / 43卷 / 43期

关键词：

fluorine; imprinting; lithography; nanostructures; polymers;

D O I：

10.1002/anie.200461122

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Making a good impression: Photocurable, liquid perfluoropolyethers (PFPEs) are ideal materials for high-resolution (< 100 nm) pattern transfer and imprint lithographic processes (see pictures). PFPEs possess attributes of both elastomers and rigid materials, exhibit a remarkably low surface energy, mold extremely small features with high fidelity, resist swelling by organic solvents, and endure repetitive molding procedures.

引用

收藏

页码：5796 / 5799

页数：4

相关论文

共 26 条

[1] Fabrication of nanocontacts for molecular devices using nanoimprint lithography [J].

Austin, M ;

Chou, SY .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (02) :665-667

[2] Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography [J].

Austin, MD ;

Ge, HX ;

Wu, W ;

Li, MT ;

Yu, ZN ;

Wasserman, D ;

Lyon, SA ;

Chou, SY .

APPLIED PHYSICS LETTERS, 2004, 84 (26) :5299-5301

[3] Fabrication of 70 nm channel length polymer organic thin-film transistors using nanoimprint lithography [J].

Austin, MD ;

Chou, SY .

APPLIED PHYSICS LETTERS, 2002, 81 (23) :4431-4433

[4] Step and flash imprint lithography: Template surface treatment and defect analysis [J].

Bailey, T ;

Choi, BJ ;

Colburn, M ;

Meissl, M ;

Shaya, S ;

Ekerdt, JG ;

Sreenivasan, SV ;

Willson, CG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06) :3572-3577

[5] Conformal contact and pattern stability of stamps used for soft lithography [J].

Bietsch, A ;

Michel, B .

JOURNAL OF APPLIED PHYSICS, 2000, 88 (07) :4310-4318

[6] Perfluoropolyether synthesis in liquid carbon dioxide by hexafluoropropylene photooxidation [J].

Bunyard, WC ;

Romack, TJ ;

DeSimone, JM .

MACROMOLECULES, 1999, 32 (24) :8224-8226

[7] A photocurable poly(dimethylsiloxane) chemistry designed for soft lithographic molding and printing in the nanometer regime [J].

Choi, KM ;

Rogers, JA .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (14) :4060-4061

[8] Imprint lithography with 25-nanometer resolution [J].

Chou, SY ;

Krauss, PR ;

Renstrom, PJ .

SCIENCE, 1996, 272 (5258) :85-87

[9] Nanoimprint lithography [J].

Chou, SY ;

Krauss, PR ;

Renstrom, PJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4129-4133

[10] Replication of vertical features smaller than 2 nm by soft lithography [J].

Gates, BD ;

Whitesides, GM .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (49) :14986-14987