Thermal stability of WSix and W Schottky contacts on n-GaN

被引:21
作者
Kim, J [1 ]
Ren, F
Baca, AG
Pearton, SJ
机构
[1] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[2] Sandia Natl Labs, Albuquerque, NM 87185 USA
[3] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
关键词
D O I
10.1063/1.1576506
中图分类号
O59 [应用物理学];
学科分类号
摘要
WSix Schottky contacts on GaN are found to exhibit improved thermal stability compared to pure W contacts. While the W contacts degrade for anneal temperatures greater than or equal to500 degreesC through reaction with the GaN to form beta- W2N, the WSix contacts show a stable Schottky barrier height of similar to0.5 eV as obtained from I-V measurements up to temperatures >600 degreesC. The reverse leakage current in both types of diodes is considerably higher than predicted from thermionic emission and image-force-induced barrier height lowering. The reverse current density was found to vary approximately as V-B(0.5) (V-B is the reverse bias) and suggests the presence of additional current transport mechanism in both types of diodes. (C) 2003 American Institute of Physics.
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收藏
页码:3263 / 3265
页数:3
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