Planar waveguide formation in KTiOPO4 by MeV Ni+ ion implantation

被引:7
作者
Wang, KM [1 ]
Lu, F
Hu, H
Chen, F
Shi, BR
Shen, DY
Wang, XM
Liu, YG
机构
[1] Shandong Univ, Dept Phys, Jinan 250100, Peoples R China
[2] Peking Univ, MOE Key Lab Heavy Ion Phys, Beijing 100871, Peoples R China
[3] Shandong Univ, Inst Crystal Mat, Jinan 250100, Peoples R China
基金
中国国家自然科学基金;
关键词
ion implantation; refractive index profile; planar optical waveguide;
D O I
10.1016/S0030-4018(00)00840-3
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
KTiOPO4 (KTP) crystals were implanted with 2.6 MeV Ni+ ions to a dose of 9 X 10(14) ions/cm(2) and 2.0 MeV Ni+ ions to a dose of 8 x 10(14) ions/cm(2) under different angles at room temperature. The model 2010 prism coupler was used to measure the dark modes in KTiOPO4 waveguide. The refractive index behaviour is studied as a function of ion energy and implantation angle. The refractive index profiles in KTiOPO4 waveguide before and annealing are given based on the procedure by Chandler and Lama. The present result shows that the shape of the refractive index profile in KTiOPO4 waveguide by MeV Ni+ ions is different from the one by MeV He+ ions. The fibre probe technique was used to estimate the loss of the waveguide. (C) 2000 Published by Elsevier Science B.V.
引用
收藏
页码:357 / 360
页数:4
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