Field emission from metal particles bound with a photoresist

被引:5
作者
Baba, A [1 ]
Asano, T [1 ]
机构
[1] Kyushu Inst Technol, Ctr Microelect Syst, Iizuka, Fukuoka 8208502, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2003年 / 21卷 / 01期
关键词
D O I
10.1116/1.1524133
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A film composed of metal particles was evaluated as a material for the fabrication of field electron emitters on large substrates. Two test films were prepared on silicon substrates from either a mixture of fine palladium particles or spin-on glass and a mixture of fine palladium particles and a positive tone photoresist. Field electron emission characteristics were evaluated with a diode. It was found that the insulating film on the surface of the electron emitting material acted as a barrier to electron emission. It was also found that, with the application of a constant voltage, the field emission current abruptly increased with time in the initial stage of field electron emission. Following this phenomenon the threshold voltage for electron emission was drastically reduced and the emission current fluctuation was less than 10%. (C) 2003 American Vacuum Society.
引用
收藏
页码:552 / 556
页数:5
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