The anisotropic dielectric function for copper phthalocyanine thin films

Copper phthalocyanine (CuPc) thin films were prepared by organic molecular beam deposition (OMBD) in high vacuum and ultra-high vacuum on passivated Si(111) using beta-phase CuPc as source material. The substrates were kept at room temperature during the deposition. The IR peak positions indicate that the films consist mainly of alpha-phase CuPc, while the relative intensities suggest that the films are anisotropic. The anisotropic dielectric function for these CuPc layers was determined from ellipsometric spectra using uniaxial models in the range from 0.73 to 5eV. (C) 2004 Elsevier B.V. All rights reserved.