Transport properties of Ni-WS2 photoconductive thin films

被引:10
作者
Lignier, O [1 ]
Couturier, G [1 ]
Salardenne, J [1 ]
机构
[1] Univ Bordeaux 1, Ctr Phys Mol Opt & Hertzienne, CNRS URA 283, F-33405 Talence, France
关键词
D O I
10.1063/1.366483
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is shown that the annealing under Ar of sputtered WSx amorphous films deposited on Ni coated substrates gives bidimensional polycrystalline 2H-WS2 films. Ni enhances the formation of large crystallites. The temperature dependence of the mobility and its dependence versus the Ni content clearly show that transport properties are governed by grain boundaries. A basic grain boundary model like the model of Seto is well suited to explain the electrical properties. The photoconductivity enhancement resulting from nickel is assigned to a decrease of the number of the electrical barriers. However, noise measurements are not consistent with Hall measurements; a model is thus proposed to explain the 1/f noise excess in relation to the traces of Ni-W revealed by x-ray diffraction. (C) 1997 American Institute of Physics.
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页码:6110 / 6115
页数:6
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