The effect of series resistance on the relationship between barrier heights and ideality factors of inhomogeneous Schottky barrier diodes

被引:31
作者
Akkiliç, K [1 ]
Aydin, ME
Türüt, A
机构
[1] Univ Dicle, Fac Educ, Diyarbakir, Turkey
[2] Univ Dicle, Fac Sci & Art, Dept Phys, Diyarbakir, Turkey
[3] Ataturk Univ, Fac Sci & Art, Dept Phys, TR-25240 Erzurum, Turkey
关键词
D O I
10.1088/0031-8949/70/6/007
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We have studied Cd/n-Si (33 dots) Schottky barrier diodes (SBDs). Si surfaces have been prepared by the usual chemical etching. and the evaporation of metal has been carried out in a conventional vacuum system. The effective Schottky barrier heights (SBHs) and ideality factors obtained from the current-voltage (I-V) characteristics differ from diode to diode although the samples were identically prepared. The SBH for the Cd/n-Si diodes ranged from 0.605 eV to 0.701 eV. and ideality factor n from 1.213 to 1.913. The reason for that the experimental data differ from diode to diode has been analyzed by applying thermionic emission theory (TET) of inhomogeneous Schottky contacts together with standard TET and thus the effect of series resistance on the relationship between barrier heights and ideality factors of the inhomogeneous SBDs has clearly been shown. A laterally homogeneous SBH value of approximately 0.770eV for Cd/n-Si SDs has been obtained by the barrier inhomogeneity model.
引用
收藏
页码:364 / 367
页数:4
相关论文
共 24 条
[1]   SURFACE STATES AND RECTIFICATION AT A METAL SEMI-CONDUCTOR CONTACT [J].
BARDEEN, J .
PHYSICAL REVIEW, 1947, 71 (10) :717-727
[2]   On the existence of a distribution of barrier heights in Pd2Si/Si Schottky diodes [J].
Chand, S ;
Kumar, J .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (01) :288-294
[3]   CURRENT-VOLTAGE CHARACTERISTICS AND BARRIER PARAMETERS OF PD2SI/P-SI(111) SCHOTTKY DIODES IN A WIDE TEMPERATURE-RANGE [J].
CHAND, S ;
KUMAR, J .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1995, 10 (12) :1680-1688
[4]   Morphology and interfacial properties of microrelief metal-semiconductor interface [J].
Dmitruk, NL ;
Borkovskaya, OY ;
Dmitruk, IN ;
Mamykin, SV ;
Horvath, ZJ ;
Mamontova, IB .
APPLIED SURFACE SCIENCE, 2002, 190 (1-4) :455-460
[5]   INFLUENCE OF BARRIER HEIGHT DISTRIBUTION ON THE PARAMETERS OF SCHOTTKY DIODES [J].
DOBROCKA, E ;
OSVALD, J .
APPLIED PHYSICS LETTERS, 1994, 65 (05) :575-577
[6]   A comparative study of electrochemically formed and vacuum-deposited n-GaAs/Au Schottky barriers using ballistic electron emission microscopy (BEEM) [J].
Forment, S ;
Van Meirhaeghe, RL ;
De Vrieze, A ;
Strubbe, K ;
Gomes, WP .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2001, 16 (12) :975-981
[7]   Temperature dependent barrier characteristics of CrNiCo alloy Schottky contacts on n-type molecular-beam epitaxy GaAs [J].
Gümüs, A ;
Türüt, A ;
Yalçin, N .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (01) :245-250
[8]  
GURDER H, 1990, APPL PHYS LETT, V56, P1113
[9]   BALLISTIC-ELECTRON-EMISSION MICROSCOPY INVESTIGATION OF SCHOTTKY-BARRIER INTERFACE FORMATION [J].
HECHT, MH ;
BELL, LD ;
KAISER, WJ ;
GRUNTHANER, FJ .
APPLIED PHYSICS LETTERS, 1989, 55 (08) :780-782
[10]   Current transport at the p-InP|poly(pyrrole) interface [J].
Jones, FE ;
Daniels-Hafer, C ;
Wood, BP ;
Danner, RG ;
Lonergan, MC .
JOURNAL OF APPLIED PHYSICS, 2001, 90 (02) :1001-1010