Ultra-high resolution index of refraction profiles of femtosecond laser modified silica structures

被引：64

作者：

Taylor, RS

Hnatovsky, C

Simova, E

Rayner, DM

Mehandale, M

Bhardwaj, VR

Corkum, PB

机构：

[1] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada

[2] Natl Res Council Canada, Steacie Inst Mol Sci, Ottawa, ON K1A 0R6, Canada

来源：

OPTICS EXPRESS | 2003年 / 11卷 / 07期

关键词：

D O I：

10.1364/OE.11.000775

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The combination of selective chemical etching and atomic force microscopy has been used for the first time to make ultra-high spatial resolution (20 nm) index of refraction profiles of femtosecond laser modified structures in silica glass. (C) 2003 Optical Society of America.

引用

收藏

页码：775 / 781

页数：7

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