Influence of the gate leakage current on the stability of organic single-crystal field-effect transistors

被引:43
作者
de Boer, RWI [1 ]
Iosad, NN [1 ]
Stassen, AF [1 ]
Klapwijk, TM [1 ]
Morpurgo, AF [1 ]
机构
[1] Delft Univ Technol, Fac Sci Appl, Kavli Inst Neurosci, NL-2628 CJ Delft, Netherlands
关键词
D O I
10.1063/1.1852089
中图分类号
O59 [应用物理学];
学科分类号
摘要
We investigate the effect of a small leakage current through the gate insulator on the stability oforganic single-crystal field-effect transistors (FETs). We find that, irrespective of the specific organic molecule and dielectric used, leakage current flowing through the gate insulator results in an irreversible degradation of the single-crystal FET performance. This degradation occurs even when the leakage current is several orders of magnitude smaller than the source-drain current. The experimental data indicate that a stable. operation requires the leakage current to be smaller than 10-9 A/cm(2). Our results also suggest that gate leakage currents may determine the lifetime of thin-film transistors used in applications. (C) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
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