Ab initio calculations of the β-SiC(001)/Al interface

被引:83
作者
Hoekstra, J [1 ]
Kohyama, M [1 ]
机构
[1] AIST, Osaka Natl Res Inst, Dept Mat Phys, Osaka 563, Japan
关键词
D O I
10.1103/PhysRevB.57.2334
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The beta-SiC/Al interface has been studied using the ab initio pseudopotential method, the conjugate-gradient technique proposed by Bylander, Kleinman, and Lee [Phys. Rev. B 42, 1394 (1990)], and Troullier-Martins soft pseudopotentials [Phys. Rev. B 43, 8861 (1991)]. Ionic and electronic structures at the interface, local density of states, Schottky-barrier heights, and bond adhesion between the two materials were determined for both the silicon-terminated and carbon-terminated interfaces. Results show a distinct difference between the Al-Si and the Al-C interactions effecting all aspects of the chemical bond, as well as bond adhesion. However, bond adhesion for both the Si-terminated and C-terminated interfaces is substantially greater than for nonreactive interfaces such as MgO/Al.
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页码:2334 / 2341
页数:8
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