Persistent layer-by-layer sputtering of Au(111)

被引：7

作者：

Murty, MVR

Couture, AJ

Cooper, BH

Woll, AR

Brock, JD

Headrick, RL

机构：

[1] Cornell Univ, Dept Phys, Ithaca, NY 14853 USA

[2] Cornell Univ, Cornell Ctr Mat Res, Ithaca, NY 14853 USA

[3] Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USA

[4] Cornell Univ, Cornell High Energy Synchrotron Source, Wilson Lab, Ithaca, NY 14853 USA

来源：

JOURNAL OF APPLIED PHYSICS | 2000年 / 88卷 / 01期

关键词：

D O I：

10.1063/1.373703

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Persistent layer-by-layer removal of Au(111) during Ar+ ion irradiation was observed in a real-time x-ray scattering study. Over 100 specular beam intensity oscillations were measured. For a given ion energy, a smoother surface morphology is obtained when the ion flux is reduced. For a fixed erosion rate, ion energy in the range of 70-500 eV does not have a strong influence on the evolution of surface morphology. Diffuse scattering measurements show the development of features with a characteristic lateral length scale on the surface during ion irradiation. (C) 2000 American Institute of Physics. [S0021-8979(00)06213-7].

引用

页码：597 / 599

页数：3

共 21 条

[1] Step-adatom attraction as a new mechanism for instability in epitaxial growth [J].